In this study, The diode characteristics of the thin film of metal-oxide (CuO) was investigated. Spin coating method was used to grow CuO nano-structured thin films interfaced between the metal and semiconductor and an diode structure of Al / CuO / p-Si / Al was produced. Ideality factor (n) and barrier height (ΦB0) were calculated from conventional (I-V) characteristics of Al /CuO/p-Si /Al diode structure and series resistance values (Rs) were calculated by using Norde functions. Scanning electron microscope (SEM) images of that films were obtained. Furtheremore, the optical properties of CuO films were analyzed with UV-VIS spectroscopy, and then the optical energy band gap was determined as 2.08 eV.
The calculations suggest that the produced diode was a rectifier diode with photodiodes feature.